Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond

2D transition metal dichalcogenides (TMDCs) are among the most exciting materials of today. Their layered crystal structures result in unique and useful electronic, optical, catalytic, quantum properties. To realize technological potential TMDCs, methods depositing uniform films controlled thickness at low temperatures a highly controllable, scalable, repeatable manner needed. Atomic layer deposition (ALD) is chemical gas-phase thin film method capable meeting these challenges. In this review, applications evaluated for ALD TMDCs systematically examined, including electronics optoelectonics, electrocatalysis photocatalysis, energy storage, lubrication, plasmonics, solar cells, photonics. This review focuses on understanding interplay between precursors conditions, resulting characteristics such as thickness, crystallinity, morphology, ultimately device performance. Through rational choice observed to exhibit meet varying requirements widely different applications. Beyond current state future prospects, opportunities, challenges discussed. The authors hope that aids bringing together experts fields ALD, various eventually industrial TMDCs.